Applications
It is mainly used for the removal of microscopic organic contaminants and oxides, activation, modification and polymer coating on material surfaces, featuring high efficiency and non-destructive treatment. It’s configured with a high-capacity chamber, suitable for batch production.
Features
Non-destructive cleaning
Superior deoxidation cleaning capability
Excellent cleaning selectivity
Low process temperature
Efficient productivity
Intuitive user interface
Specifications
Plasma Generator | 2.45 GHz, 100-1000W |
Internal Chamber Size | W400mm✕H435mm✕D495mm |
Chamber Material | Aerospace-grade aluminum alloy |
Gas Channels | Standard with 2 MFCs, more on request |
Vacuum Gauge | Pirani gauge |
Chamber Vacuum | Better than 5 Pa |
Worktable | Φ340mm rotary worktable |
Control System | IPC+PLC |
Power Supply | 380V, 50/60Hz |