Microwave Plasma Cleaning System MWD-80
  • Microwave Plasma Cleaning System MWD-80
  • Microwave Plasma Cleaning System MWD-80
  • Microwave Plasma Cleaning System MWD-80
  • Microwave Plasma Cleaning System MWD-80
  • Microwave Plasma Cleaning System MWD-80
  • Microwave Plasma Cleaning System MWD-80
  • Microwave Plasma Cleaning System MWD-80

Microwave Plasma Cleaning System MWD-80

Full-Function System. Suitable for Batch Production

Applications

It is mainly used for the removal of microscopic organic contaminants and oxides, activation, modification and polymer coating on material surfaces, featuring high efficiency and non-destructive treatment. It’s configured with a high-capacity chamber, suitable for batch production.

 

Features

Non-destructive cleaning

Superior deoxidation cleaning capability

Excellent cleaning selectivity

Low process temperature

Efficient productivity

Intuitive user interface


Specifications

Plasma Generator

2.45 GHz, 100-1000W

Internal Chamber Size

W400mm✕H435mm✕D495mm

Chamber Material

Aerospace-grade aluminum alloy

Gas Channels

Standard with 2 MFCs, more on request

Vacuum Gauge

Pirani gauge

Chamber Vacuum

Better than 5 Pa

Worktable

Φ340mm rotary worktable

Control System

IPC+PLC

Power Supply

380V, 50/60Hz