MIcrowave Plasma PR Descum System MWD-80E
  • MIcrowave Plasma PR Descum System MWD-80E

MIcrowave Plasma PR Descum System MWD-80E

ApplicationsIt is mainly used for the removal of residual photoresist and organic contamination, and plasma surface modificat

Applications

It is mainly used for the removal of residual photoresist and organic contamination, and plasma surface modification. It features non-destructive and fast photoresist descum.


Features

Non-destructive descum

Downstream plasma

Precise heating temperature control

Rapid descum rate

Workholder height adjustable

Intuitive user interface


Specifications

Plasma Generator

2.45GHz, 100-1000W

Work Holder Size

Φ300mm

Chamber Material

Aerospace-grade aluminum alloy

Gas Channels

Standard with 2 MFCs, more on request

Vacuum Gauge

Pirani gauge

Vacuum Pump

Dry or oil pump

Chamber Vacuum

Better than 5Pa

Temperature Control

30~150℃, adjustable

Clearance over Workholder

150~380mm adjustable (from workholder to Faraday cage)

PR Etch Rate

Max 100nm/min (depending on processes)

Control System

IPC & PLC control

Enclosure Dimension

W1300mm✕D1300mm✕H1250mm (tower lamp excluded)

Weight

Approx. 435kg (vacuum pump excluded)