Applications
It is mainly used for activation, modification, and removal of organic contaminants on materials surface, capable of processing a wide range of materials including inorganics, polymers, glass, and metals. It is suitable for manufacturing of LCD/OLED display and solar cell, especially ideal for the cleaning of precision circuits sensitive to static electricity and heat.
Features
No electrode damage and sputtering contamination
Plasma sustained at atmospheric pressure
High degree of gas ionization and dissociation
Stable and easy-to-control microwave generator
Customizable nozzles for diverse applications
Plasma plume length & coverage area adjustable
Low self-bias voltage, avoiding damage to precision circuits
Low plasma temperature, avoiding heat damage to products
Specifications
Dimensions | Head: R73.4mm✕H129.2mm Control unit: L419.5mm✕W280mm✕H140mm |
Plasma Power | 50~250W |
Plasma Frequency | 2.45GHz |
Frequency Deviation | ±50ppm |
Microwave Leakage | <2mW/cm² |
Supply Voltage | AC220V±10% |
Supply Frequency | 50Hz±2Hz |
Control Mode | Local mode / IO mode |
Maximum VSWR | 2:1 |
Operating Mode | Continuous Wave (CW) |
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