Applications
Utilizing a microwave source array, it generates high-density plasma to rapidly remove microscopic contaminants from material surfaces. Equipped with an advanced automated control system and high-efficiency automatic loading/unloading assembly, it seamlessly connects with upstream and downstream production line equipment, significantly enhancing processing efficiency.
Features
Non-destructive cleaning
High-density plasma
Highly uniform cleaning effects
Fast cleaning cycle
Superior capability of deoxidation cleaning
Automatic control system
Specifications
Plasma Generator | 2.45GHz, Max 2000W (magnetron) / Max 2500W (solid-state generator) |
Internal Chamber Size | W370mm✕D560mm✕H110mm |
Chamber Material | Aerospace-grade aluminum alloy |
Gas Channels | Standard with 2 MFCs, more on request |
Vacuum Gauge | Pirani gauge or capacitance manometer |
Vacuum Pump | Dry or oil pump |
Chamber Vacuum | Better than 5Pa |
Operation Flow | Automatic loading & cleaning & unloading |
Control System | IPC&PLC |
Enclosure Dimension | W900mm✕D1500mm✕H1800mm (tower lamp excluded) |
Weight | Approx. 600kg (vacuum pump excluded) |
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